Accelerating Computational Lithography With GPU Rasterization
Addressing a bottleneck in nanometer-scale semiconductor manufacturing. The post Accelerating Computational Lithography With GPU Rasterization appeared first on Semiconductor Engineering.
Addressing a bottleneck in nanometer-scale semiconductor manufacturing. The post Accelerating Computational Lithography With GPU Rasterization appeared first on Semiconductor Engineering.
The Korea Research Institute of Standards and Science (KRISS) has developed a room-temperature single-photon source built into a compact 19-inch rack-mounted device that operates without cryogenic cooling. Designed as a plug-and-play system that works as soon as it is powered on, the device moves quantum light source technology beyond the laboratory and closer to practical, onsite use.
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Researchers from NIST, University of Maryland, and Johns Hopkins University published a technical paper titled “Effect of Exchange-Correlation Functionals on Schottky Barriers at Si/Metal Interfaces.” Abstract excerpt “Accurate prediction of Schottky barrier heights (SBHs) at metal–semiconductor interfaces is essential for understanding and optimizing charge injection in electronic and optoelectro
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Researchers from Carnegie Mellon University and UCLA published a technical paper titled “AgRefactor: Self-Evolving Agentic Workflow for HLS Compatibility and Performance.” The paper introduces an “LLM-based multi-agent workflow for refactoring software into HLS-compatible programs” and reports a 6.51× geometric mean speedup over a state-of-the-art pragma tuning tool. Find the technical paper here
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